US 12,306,544 B2
Metrology tool with position control of projection system
Hans Butler, Best (NL); Arie Jeffrey Den Boef, Waalre (NL); Mark Constant Johannes Baggen, Eindhoven (NL); Jeroen Arnoldus Leonardus Johannes Raaymakers, Oirschot (NL); and Richard Carl Zimmerman, Brookfield, CT (US)
Assigned to ASML HOLDING N.V., Veldhoven (NL); and ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 18/026,115
Filed by ASML NETHERLANDS B.V., Veldhoven (NL); and ASML HOLDING N.V., Veldhoven (NL)
PCT Filed Aug. 24, 2021, PCT No. PCT/EP2021/073400
§ 371(c)(1), (2) Date Mar. 13, 2023,
PCT Pub. No. WO2022/063508, PCT Pub. Date Mar. 31, 2022.
Claims priority of provisional application 63/084,052, filed on Sep. 28, 2020.
Prior Publication US 2023/0359127 A1, Nov. 9, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70625 (2013.01) [G03F 7/706835 (2023.05)] 20 Claims
OG exemplary drawing
 
1. A metrology tool comprising:
a substrate table of the metrology tool, the substrate configured to hold a substrate;
a projection system of the metrology tool, the projection system configured to project a measurement or inspection beam on a target portion of the substrate;
an actuator configured to adjust a position of the projection system relative to the substrate on the substrate table;
a sensor configured to determine a position of the substrate table; and
one or more processors configured to:
determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and
control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.