US 12,306,543 B2
Optical imaging method, device and system for photolithography system
Haiqing Wei, Hubei (CN); and Xianhua Ke, Hubei (CN)
Assigned to WUHAN YUWEI OPTICAL SOFTWARE CO., LTD., Hubei (CN)
Filed by Wuhan Yuwei Optical Software Co., Ltd., Hubei (CN)
Filed on Nov. 23, 2022, as Appl. No. 17/993,715.
Claims priority of application No. 202211200847.5 (CN), filed on Sep. 29, 2022.
Prior Publication US 2024/0126179 A1, Apr. 18, 2024
Int. Cl. G03F 7/00 (2006.01); G03F 1/36 (2012.01); G06F 30/30 (2020.01); G06F 30/398 (2020.01)
CPC G03F 7/705 (2013.01) [G03F 1/36 (2013.01); G03F 7/70441 (2013.01); G06F 30/398 (2020.01)] 10 Claims
OG exemplary drawing
 
1. An optical imaging simulation method for a photolithography system, comprising the steps of:
determining a photolithographic imaging model based on a transmission cross coefficient and mask near-field distribution, wherein said transmission cross coefficient reflects the physical symmetry of the photolithography system and said photolithographic imaging model is used for simulating a photolithographic imaging process to obtain an aerial image of a mask in the photolithography system;
solving the transmission cross coefficient based on a Lanczos method and using a parity operator to ensure the symmetric properties of the transmission cross coefficient during the numerical solution process to obtain a characteristic kernel function of the transmission cross coefficient, wherein said parity operator is used to project an arbitrary vector into a predetermined symmetric space, so as to constrain the arbitrary vector to be symmetrical according to the predetermined symmetry, and in the process of solving said characteristic kernel function of the transmission cross coefficient, said parity operator constrains the solved characteristic kernel function in real time to ensure that each solved kernel function satisfies the same physical symmetry of the photolithography system;
solving a photolithographic imaging model by combining the mask near-field distribution and each characteristic kernel function and obtaining an aerial image of the mask by simulation.