US 12,306,541 B2
Lithographic apparatus, metrology systems, illumination switches and methods thereof
Mohamed Swillam, Wilton, CT (US); and Marinus Petrus Reijnders, Eindhoven (NL)
Assigned to ASML Holding N.V. & ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 18/012,308
Filed by ASML Holding N.V., Veldhoven (NL); and ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Jun. 4, 2021, PCT No. PCT/EP2021/065078
§ 371(c)(1), (2) Date Dec. 22, 2022,
PCT Pub. No. WO2021/259618, PCT Pub. Date Dec. 30, 2021.
Claims priority of provisional application 63/042,753, filed on Jun. 23, 2020.
Prior Publication US 2023/0213868 A1, Jul. 6, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70258 (2013.01) [G03F 7/70275 (2013.01); G03F 7/7085 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A system comprising:
an illumination system, the illumination system including a broadband light source configured to generate a beam of radiation;
a dispersive optical element configured to receive the beam of radiation and generate a plurality of light beams having a narrower bandwidth than the broadband light source;
an optical switch configured to receive the plurality of light beams and transmit each one of the plurality of light beams to a respective one of a plurality of alignment sensors of a sensor array; and
processing circuitry configured to receive radiation returning from the sensor array and to generate a measurement signal based on the received radiation.