	US 12,306,538 B2
	Treatment liquid and pattern forming method
Hideaki Tsubaki, Shizuoka (JP); Toru Tsuchihashi, Shizuoka (JP); Wataru Nihashi, Shizuoka (JP); and Kei Yamamoto, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Feb. 17, 2021, as Appl. No. 17/178,218.
Application 17/178,218 is a division of application No. 15/937,876, filed on Mar. 28, 2018, granted, now 10,962,884.
Application 15/937,876 is a continuation of application No. PCT/JP2016/078230, filed on Sep. 26, 2016.
Claims priority of application No. 2015-195057 (JP), filed on Sep. 30, 2015.
Prior Publication US 2021/0200097 A1, Jul. 1, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/32 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/075 (2006.01); G03F 7/095 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01); H01L 21/304 (2006.01)

CPC G03F 7/32 (2013.01) [G03F 7/0043 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/0382 (2013.01); G03F 7/039 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/0758 (2013.01); G03F 7/095 (2013.01); G03F 7/11 (2013.01); G03F 7/16 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); H01L 21/304 (2013.01)]

5 Claims

1. A rinsing liquid for patterning a resist film,

used for subjecting a resist film obtained from an actinic ray-sensitive or radiation-sensitive resin composition to washing, and

containing an organic solvent,

wherein the rinsing liquid contains a first organic solvent having a solubility parameter value of 16.3 MPa^1/2or less and a second organic solvent having a solubility parameter value of 17.1 MPa^1/2or more,

the first organic solvent is undecane,

the second organic solvent contains at least one solvent selected from the group consisting of butyl acetate and 2-heptanone as a major component, and at least one solvent selected from the group consisting of propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether as a minor component,

a content of the undecane is 40% by mass or less with respect to a total mass of the rinsing liquid, and

the rinsing liquid does not include a polymer.