US 12,306,535 B2
Photoacid generator for chemically amplified photoresists for deep ultra violet and extreme ultraviolet lithography
Gerhard Ingmar Meijer, Zurich (CH); Valery Weber, Gattikon (CH); and Peter Willem Jan Staar, Zurich (CH)
Assigned to International Business Machines Corporation, Armonk, NY (US)
Filed by International Business Machines Corporation, Armonk, NY (US)
Filed on Jan. 20, 2022, as Appl. No. 17/648,495.
Prior Publication US 2023/0229077 A1, Jul. 20, 2023
Int. Cl. G03F 7/004 (2006.01); C07C 381/12 (2006.01); C07F 5/02 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01)
CPC G03F 7/0045 (2013.01) [C07C 381/12 (2013.01); C07F 5/027 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A composition, comprising:
a photoacid generator (PAG) anion, comprising:
a first moiety selected from the group consisting of an alkyl group, a monocyclic aromatic group, and a bicyclic aromatic group, wherein the first moiety comprises a carbon atom with a negative elementary charge;
an electron acceptor atom selected from the group consisting of boron(III), aluminum(III), and phosphorus(V), wherein the electron acceptor atom is covalently bonded to the carbon atom; and
R groups comprising at least one electron-withdrawing R group.