US 12,306,532 B2
Pellicle frame and pellicle
Yu Yanase, Annaka (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
Filed on Mar. 28, 2024, as Appl. No. 18/620,093.
Application 18/620,093 is a continuation of application No. 18/101,936, filed on Jan. 26, 2023, granted, now 11,971,655.
Application 18/101,936 is a continuation of application No. 17/556,440, filed on Dec. 20, 2021, granted, now 11,592,739, issued on Feb. 28, 2023.
Application 17/556,440 is a continuation of application No. 16/735,116, filed on Jan. 6, 2020, granted, now 11,237,476, issued on Feb. 1, 2022.
Claims priority of application No. 2019-016992 (JP), filed on Feb. 1, 2019.
Prior Publication US 2024/0241435 A1, Jul. 18, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 1/64 (2012.01)
CPC G03F 1/64 (2013.01) 12 Claims
 
1. A pellicle comprising:
a pellicle film; and
a pellicle frame having two end faces in a frame shape, having a plurality of ventilation parts each including a depression at the end face of the side, to which the pellicle film is attached, wherein at least one of the depressions has no curved part, so that a damage to the pellicle film, which is caused by an air resistance through a ventilation passage when the pressure is changed from a vacuum to an atmospheric pressure, is prevented.