US 12,306,500 B2
Alignment processing device and manufacturing method of liquid crystal optical element
Koichi Igeta, Tokyo (JP); Ayaka Higuchi, Tokyo (JP); Junji Kobashi, Tokyo (JP); Yasushi Tomioka, Tokyo (JP); Shinichiro Oka, Tokyo (JP); and Hiroyuki Yoshida, Suita (JP)
Assigned to Japan Display Inc., Tokyo (JP); and Osaka University, Osaka (JP)
Filed by Japan Display Inc., Tokyo (JP); and OSAKA UNIVERSITY, Suita (JP)
Filed on May 10, 2024, as Appl. No. 18/660,333.
Claims priority of application No. 2023-078595 (JP), filed on May 11, 2023.
Prior Publication US 2024/0377681 A1, Nov. 14, 2024
Int. Cl. G02F 1/1335 (2006.01); G02F 1/1337 (2006.01)
CPC G02F 1/133788 (2013.01) [G02F 1/133509 (2013.01); G02F 1/13355 (2021.01)] 7 Claims
OG exemplary drawing
 
1. An alignment processing device comprising:
a light source;
a polarizing beam splitter which divides light emitted from the light source into first linearly polarized light and second linearly polarized light;
a mask provided between the light source and the polarizing beam splitter;
a first optical system which guides the first linearly polarized light to an exposure area;
a second optical system which guides the second linearly polarized light to the exposure area;
a first retardation film which converts the first linearly polarized light into first circularly polarized light;
a second retardation film which converts the second linearly polarized light into second circularly polarized light which rotates in an opposite direction of the first circularly polarized light;
a moving mechanism configured to move a processing substrate in which a thin film is formed on a main surface of a transparent substrate in a direction parallel to the main surface; and
a controller which controls the light source and the moving mechanism, wherein
the mask has an aperture formed into a polygonal shape,
interfering light is formed in the exposure area by the first circularly polarized light and the second circularly polarized light, and
the controller performs control so as to repeat a process of exposing part of an area of the thin film by the interfering light and a process of moving the processing substrate.