US 12,306,387 B2
Light source apparatus, lithography apparatus, and article manufacturing
Takayuki Yamaguchi, Tochigi (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Nov. 30, 2022, as Appl. No. 18/060,041.
Claims priority of application No. 2021-197806 (JP), filed on Dec. 6, 2021.
Prior Publication US 2023/0176351 A1, Jun. 8, 2023
Int. Cl. G03F 7/00 (2006.01); G02B 19/00 (2006.01); G03B 21/20 (2006.01); G03B 21/28 (2006.01)
CPC G02B 19/0028 (2013.01) [G03B 21/2006 (2013.01); G03B 21/28 (2013.01); G03F 7/70016 (2013.01); G03F 7/70175 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A light source apparatus configured to emit light, the light source apparatus comprising:
a condenser unit configured to reflect light from a light source and to condense the light on a condensing point;
a light shielding unit disposed on an optical path of the light from the condenser unit; and
a reflector unit disposed between the condenser unit and the light shielding unit and configured to reflect the light from the condenser unit,
wherein the reflector unit is disposed so that reflected light is condensed by the condenser unit toward the condensing point.