US 12,305,983 B2
Methods and apparatus for measuring a feature of glass-based substrate
Earle William Gillis, Elmira, NY (US); and Aaron Russell Greenbaum, Pittsford, NY (US)
Assigned to CORNING INCORPORATED, Corning, NY (US)
Appl. No. 17/920,528
Filed by Corning Incorporated, Corning, NY (US)
PCT Filed Jun. 10, 2021, PCT No. PCT/US2021/036739
§ 371(c)(1), (2) Date Oct. 21, 2022,
PCT Pub. No. WO2021/257362, PCT Pub. Date Dec. 23, 2021.
Claims priority of provisional application 63/040,247, filed on Jun. 17, 2020.
Prior Publication US 2023/0152082 A1, May 18, 2023
Int. Cl. G01B 9/02098 (2022.01); G01B 11/02 (2006.01); G01B 11/24 (2006.01)
CPC G01B 9/02098 (2013.01) [G01B 11/02 (2013.01); G01B 11/24 (2013.01)] 15 Claims
OG exemplary drawing
 
1. An apparatus comprising:
an illumination source positioned in a first region and at least one wave front sensor positioned in the first region;
a reflector positioned in a second region;
a measurement plane positioned between the first region and the second region, wherein the illumination source is configured to emit light that impinges on the measurement plane, the reflector is configured to reflect the light from the illumination source, and the at least one wave front sensor is configured to detect the light reflected by the reflector;
a beam splitter configured to split the light into a plurality of beams; and
the at least one wave front sensor comprises a first wave front sensor configured to detect a first beam of the plurality of beams and a second wave front sensor configured to detect a second beam of the plurality of beams.