US 12,305,274 B1
PVD target and use thereof
Jianzhong Tang, Zhejiang (CN); Mingwei Zhang, Zhejiang (CN); and Yiqi Yao, Zhejiang (CN)
Assigned to ZHEJIANG SHINTOWN INDUSTRY CO., LTD, Zhejiang (CN)
Filed by ZHEJIANG SHINTOWN INDUSTRY CO., LTD, Zhejiang (CN)
Filed on Oct. 23, 2024, as Appl. No. 18/923,813.
Application 18/923,813 is a continuation of application No. PCT/CN2024/097436, filed on Jun. 5, 2024.
Claims priority of application No. 202410543384.5 (CN), filed on May 5, 2024.
Int. Cl. C23C 14/34 (2006.01); C23C 14/02 (2006.01); C23C 14/35 (2006.01); H01J 37/34 (2006.01)
CPC C23C 14/3414 (2013.01) [C23C 14/021 (2013.01); C23C 14/35 (2013.01); H01J 37/3426 (2013.01)] 7 Claims
OG exemplary drawing
 
1. Use of a physical vapor deposition (PVD) target in cookware, wherein a PVD coating is provided on an internal metal layer of the cookware by depositing the PVD target on the internal metal layer of the cookware using a PVD process, the PVD target consists of the following components by mass percentage: silicon 10-30% and a balance metal, wherein the metal comprises one or more selected from a group consisting of chromium, zirconium, and titanium, and a thickness of the PVD coating is 0.8-3 μm.