US 12,305,271 B2
Item comprising an organic-inorganic layer with a low refractive index
Sébastien Chiarotto, Charenton-le-pont (FR); Jolanta Klemberg-Sapieha, Montreal (CA); and Martin Caron, Montreal (CA)
Assigned to Essilor International, Charenton-le-pont (FR); and Corporation de l'Ecole Polytechnique de Montréal, Montreal (CA)
Filed by ESSILOR INTERNATIONAL, Charenton-le-pont (FR); and CORPORATION DE L'ECOLE POLYTECHNIQUE DE MONTREAL, Montreal (CA)
Filed on Jul. 6, 2021, as Appl. No. 17/367,928.
Application 17/367,928 is a continuation of application No. 16/063,545, abandoned, previously published as PCT/FR2016/053525, filed on Dec. 16, 2016.
Claims priority of application No. 1562857 (FR), filed on Dec. 18, 2015.
Prior Publication US 2021/0405261 A1, Dec. 30, 2021
Int. Cl. C23C 14/00 (2006.01); C09D 183/04 (2006.01); C23C 14/10 (2006.01); C23C 14/12 (2006.01); C23C 14/24 (2006.01); G02B 1/111 (2015.01); G02B 1/115 (2015.01)
CPC C23C 14/0031 (2013.01) [C09D 183/04 (2013.01); C23C 14/10 (2013.01); C23C 14/12 (2013.01); C23C 14/24 (2013.01); G02B 1/111 (2013.01); G02B 1/115 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A process for the manufacture of an article, comprising at least the following steps:
supplying an article comprising a substrate having at least one main surface;
depositing, on said main surface of the substrate, a layer L of a material M having a refractive index ranging from 1.38 to 1.47 at a wavelength of 632.8 nm; and
recovering the article, wherein said layer L has been obtained by deposition, by co-evaporation, of at least two precursors:
one metallic compound A chosen from alkaline-earth metal fluorides; and
at least one organosilicon compound B, the deposition of the organosilicon compound B, in gaseous form, being carried out in the presence of an ion bombardment so as to obtain the material M,
wherein the process comprises the step of depositing, on said main surface of the substrate, a multilayer interference coating, wherein the layer L constitutes at least one layer of said multilayer interference coating,
wherein a thin organic-inorganic layer having a thickness of 1 to 20 nm is deposited on this layer L, wherein the thin organic-inorganic layer is a low-index layer which is the external layer of the multilayer interference coating, this organic-inorganic layer being obtained by deposition of an organosilicon compound or a mixture of organosilicon compounds in gaseous form, in the presence of an ion bombardment and in the absence of a mineral precursor, and
wherein the organosilicon compound B comprises at least one divalent group of formula:

OG Complex Work Unit Chemistry
wherein each R′1 to R′4 is independently vinyl, aryl, hydroxyl, or a hydrolysable group, or wherein compound B corresponds to formula:

OG Complex Work Unit Chemistry
wherein each R′5, R′6, R′7 and R′8 is independently hydroxyl or a hydrolysable OR group, wherein R is an alkyl group.