US 12,305,003 B2
Polyamic acid having specific composition, varnish, cured product, and composite material
Takefumi Furuta, Osaka (JP); Yoshio Furukawa, Osaka (JP); Rikio Yokota, Osaka (JP); and Yuichi Ishida, Tokyo (JP)
Assigned to KANEKA CORPORATION, Osaka (JP); and Japan Aerospace Exploration Agency, Tokyo (JP)
Appl. No. 17/916,496
Filed by KANEKA CORPORATION, Osaka (JP); and JAPAN AEROSPACE EXPLORATION AGENCY, Tokyo (JP)
PCT Filed Mar. 5, 2021, PCT No. PCT/JP2021/008584
§ 371(c)(1), (2) Date Sep. 30, 2022,
PCT Pub. No. WO2021/199898, PCT Pub. Date Oct. 7, 2021.
Claims priority of application No. 2020-061088 (JP), filed on Mar. 30, 2020.
Prior Publication US 2023/0193075 A1, Jun. 22, 2023
Int. Cl. C08G 73/10 (2006.01); C08J 5/04 (2006.01); C08J 5/24 (2006.01); C08L 79/08 (2006.01); C09D 7/20 (2018.01); C09D 177/00 (2006.01); C09D 179/08 (2006.01)
CPC C08G 73/1067 (2013.01) [C08G 73/1071 (2013.01); C08J 5/04 (2013.01); C08J 5/24 (2013.01); C08J 5/243 (2021.05); C08J 5/248 (2021.05); C08L 79/08 (2013.01); C09D 7/20 (2018.01); C09D 177/00 (2013.01); C09D 179/08 (2013.01); C08J 2379/08 (2013.01)] 13 Claims
 
1. An amide acid oligomer represented by the following formula (1):

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where:
(I) n is an integer satisfying 1≤n≤100;
(II) Q represents a tetravalent residue derived from an aromatic tetracarboxylic acid (A), and contains a structural unit represented by the following general formula (2) and a structural unit represented by the following general formula (3) at a molar ratio of 80/20 to 20/80:

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(III) Y represents a divalent residue derived from an aromatic diamine (B), and contains a structural unit represented by the following general formula (4) and a structural unit represented by the following general formula (5) at a molar ratio of 100/0 to 20/80:

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where in formula (4), X1 represents a direct bond or a divalent linking group selected from the group consisting of an ether group, a carbonyl group, a sulfonyl group, a sulfide group, an amide group, an ester group, an isopropylidene group, an isopropylidene hexafluoride group, and 9,9-fluorenylidene group, and
(i) one of R1 to R5 represents one selected from the group consisting of an aryl group and a halogenated aryl group, another one of R1 to R5 represents a direct bond with a nitrogen atom in an amide bond with an acid anhydride component, the other three of R1 to R5 each independently represent one selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group, a hydroxy group, a carboxyl group, and an alkoxy group, one of R6 to R10 represents a direct bond with a nitrogen atom in an amide bond with an acid anhydride component, and the other four of R6 to R10 each independently represent one selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group, a hydroxy group, a carboxyl group, and an alkoxy group, or
(ii) one of R1 to R5 represents a direct bond with a nitrogen atom in an amide bond with an acid anhydride component, the other four of R1 to R5 each independently represent one selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group, a hydroxy group, a carboxyl group, and an alkoxy group, one of R6 to R10 represents one selected from the group consisting of an aryl group and a halogenated aryl group, another one of R6 to R10 represents a direct bond with a nitrogen atom in an amide bond with an acid anhydride component, and the other three of R6 to R10 each independently represent one selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group, a hydroxy group, a carboxyl group, and an alkoxy group; and
(IV) not less than 85 mol % and not more than 100 mol % of molecular terminals Z have structures each represented by the following formula (6) or (7), not more than 15 mol % and not less than 0 mol % of the molecular terminals Z are amine terminals each derived from an aromatic diamine component which is a raw material of the amide acid oligomer, not less than 50 mol % and not more than 100 mol % of the structures each represented by formula (6) or (7) are represented by formula (6), and not less than 0 mol % and less than 50 mol % of the structures each represented by formula (6) or (7) are represented by formula (7):

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