US 12,304,924 B2
Silylcyclodisilazane compound and method for manufacturing silicon-containing thin film using the same
Se Jin Jang, Jeju-si (KR); Sung Gi Kim, Daejeon (KR); Jeong Joo Park, Daejeon (KR); Tae Seok Byun, Daejeon (KR); Yong Hee Kwone, Cheongju-si (KR); Yeong Hun Kim, Daejeon (KR); Haengdon Lim, Daejeon (KR); Sang Yong Jeon, Sejong-si (KR); and Sang Ick Lee, Daejeon (KR)
Assigned to DNF CO., LTD., Daejeon (KR)
Appl. No. 17/753,170
Filed by DNF CO., LTD., Daejeon (KR)
PCT Filed Aug. 13, 2020, PCT No. PCT/KR2020/010771
§ 371(c)(1), (2) Date Feb. 22, 2022,
PCT Pub. No. WO2021/034014, PCT Pub. Date Feb. 25, 2021.
Claims priority of application No. 10-2019-0102771 (KR), filed on Aug. 22, 2019.
Prior Publication US 2022/0275010 A1, Sep. 1, 2022
Int. Cl. C07F 7/21 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01)
CPC C07F 7/21 (2013.01) [C23C 16/345 (2013.01); C23C 16/401 (2013.01); C23C 16/45536 (2013.01); C23C 16/45553 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A silylcyclodisilazane compound represented by the following Formula 1:

OG Complex Work Unit Chemistry
wherein
R1 to R6 are each independently hydrogen, C1-C7 alkyl, C3-C7 cycloalkyl or C2-C7 alkenyl; and
R7 is C1-C7 alkyl, C3-C7 cycloalkyl or C2-C7 alkenyl.