US 12,304,875 B2
Plasma-resistant member
Junichi Iwasawa, Fukuoka-ken (JP); and Toshihiro Aoshima, Fukuoka-ken (JP)
Assigned to Toto Ltd., Fukuoka (JP)
Filed by TOTO LTD., Kitakyushu (JP)
Filed on Mar. 7, 2023, as Appl. No. 18/118,294.
Application 18/118,294 is a division of application No. 16/246,852, filed on Jan. 14, 2019, granted, now 11,623,898.
Application 16/246,852 is a continuation of application No. 14/651,503, granted, now 10,221,105, issued on Mar. 5, 2019, previously published as PCT/JP2013/085237, filed on Dec. 27, 2013.
Claims priority of application No. 2012-287511 (JP), filed on Dec. 28, 2012; and application No. 2013-205278 (JP), filed on Sep. 30, 2013.
Prior Publication US 2023/0227375 A1, Jul. 20, 2023
Int. Cl. C04B 35/505 (2006.01); C04B 35/622 (2006.01); C04B 41/00 (2006.01); C04B 41/50 (2006.01); C04B 41/87 (2006.01); C23C 4/12 (2016.01); C23C 16/44 (2006.01); C23C 24/04 (2006.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01)
CPC C04B 41/87 (2013.01) [C04B 35/505 (2013.01); C04B 35/62222 (2013.01); C04B 41/009 (2013.01); C04B 41/5045 (2013.01); C23C 4/12 (2013.01); C23C 16/4404 (2013.01); C23C 24/04 (2013.01); H01L 21/6833 (2013.01); H01L 21/68757 (2013.01); C04B 2235/3217 (2013.01); C04B 2235/3225 (2013.01); C04B 2235/781 (2013.01); C04B 2235/785 (2013.01); C04B 2235/963 (2013.01); C04B 2237/066 (2013.01); C04B 2237/343 (2013.01); C04B 2237/592 (2013.01); Y02T 50/60 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A plasma-resistant member, comprising:
a base member; and
a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant,
the layer structural component including
a first uneven structure, and
a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure,
the second uneven structure has an unevenness in an entire surface of the layer structural component, a size of crystal particles of the unevenness being fine, and a diameter of the average crystal particle being not more than 50 nm.