	US 12,304,857 B2
	Glass substrate, semiconductor device, and display device
Shuhei Nomura, Tokyo (JP); and Kazutaka Ono, Tokyo (JP)
Assigned to AGC INC., Tokyo (JP)
Filed by AGC INC., Tokyo (JP)
Filed on Nov. 11, 2022, as Appl. No. 18/054,667.
Application 18/054,667 is a continuation of application No. 16/264,722, filed on Feb. 1, 2019, granted, now 11,554,983.
Application 16/264,722 is a continuation of application No. PCT/JP2017/027949, filed on Aug. 1, 2017.
Claims priority of application No. 2016-154682 (JP), filed on Aug. 5, 2016.
Prior Publication US 2023/0079562 A1, Mar. 16, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. C03C 3/091 (2006.01); C03C 4/20 (2006.01); G02F 1/1333 (2006.01); H01L 21/02 (2006.01); H01L 21/762 (2006.01); H10D 30/67 (2025.01); H10D 86/00 (2025.01); H10D 86/01 (2025.01); H10D 86/40 (2025.01); H10D 86/60 (2025.01); H10D 30/01 (2025.01)

CPC C03C 3/091 (2013.01) [C03C 4/20 (2013.01); G02F 1/1333 (2013.01); H01L 21/02 (2013.01); H01L 21/76251 (2013.01); H01L 21/76254 (2013.01); H01L 21/76256 (2013.01); H10D 30/67 (2025.01); H10D 30/6744 (2025.01); H10D 86/00 (2025.01); H10D 86/0212 (2025.01); H10D 86/411 (2025.01); H10D 86/421 (2025.01); H10D 86/60 (2025.01); C03C 2204/00 (2013.01); H10D 30/0323 (2025.01)]

19 Claims

1. A glass substrate, comprising:

a glass having a compaction of 0.1 to 100 ppm, and having the following glass composition, as represented by molar percentage based on oxides:

SiO₂: 50% to 75%,

Al₂O₃: 6% to 16%,

B₂O₃: 4% to 15%,

MgO: 0% to 15%,

CaO: 0% to 13%,

SrO: 0% to 11%, and

BaO: 0% to 9.5%,

wherein the glass composition satisfies:

0.0177×(content of SiO₂)−0.0173×(content of Al₂O₃)+0.0377×(content of B₂O₃)+0.0771×(content of MgO)+0.1543×(content of CaO)+0.1808×(content of SrO)+0.2082× (content of BaO)+0.0344× (log₁₀q_eq) is 2.70 to 3.20;

0.0181×(content of SiO₂)+0.0004×(content of Al₂O₃)+0.0387×(content of B₂O₃)+0.0913×(content of MgO)+0.1621×(content of CaO)+0.1900×(content of SrO)+0.2180×(content of BaO)+0.0391×(log₁₀q_eq) is 3.13 to 3.63;

0.0177×(content of SiO₂)+0.0195×(content of Al₂O₃)+0.0323×(content of B₂O₃)+0.1015×(content of MgO)+0.1686×(content of CaO)+0.1990×(content of SrO)+0.2179×(content of BaO)+0.0312×(log₁₀q_eq) is 3.45 to 3.95; and

0.0111×(content of SiO₂)+0.0250×(content of Al₂O₃)+0.0078×(content of B₂O₃)+0.0144×(content of MgO)+0.0053×(content of CaO)+0.0052×(content of SrO)+0.0013×(content of BaO)−0.0041×(log₁₀q_eq) is 1.10 to 1.30,

where the content of SiO₂, the content of Al₂O₃, the content of B₂O₃, the content of MgO, the content of CaO, the content of SrO, and the content of BaO are contents of respective components contained in the glass composition as represented by molar percentage based on oxides, and q_eqis an equivalent cooling rate (unit: ° C./min),

wherein the glass substrate has a BHF haze of 20% or less and a photoelastic constant of 33 nm/(MPa·cm) or less, and

wherein the glass substrate shows a reduction amount ((mg/cm²)/min) per unit area and unit time when the glass substrate is immersed in a 5 mass % hydrofluoric acid water solution at 25° C. of 0.07 (mg/cm²)/min or more and 0.18 (mg/cm²)/min or less.