US 12,304,833 B2
Tungsten hexafluoride manufacturing method, tungsten hexafluoride purification method, and tungsten hexafluoride
Mitsuya Ohashi, Ube (JP); Takanori Hamana, Ube (JP); Takanori Ogata, Ube (JP); and Ryuichi Nakamura, Ube (JP)
Assigned to CENTRAL GLASS COMPANY, LIMITED, Yamaguchi (JP)
Appl. No. 17/442,446
Filed by CENTRAL GLASS COMPANY, LIMITED, Yamaguchi (JP)
PCT Filed Mar. 19, 2020, PCT No. PCT/JP2020/012265
§ 371(c)(1), (2) Date Sep. 23, 2021,
PCT Pub. No. WO2020/196246, PCT Pub. Date Oct. 1, 2020.
Claims priority of application No. 2019-056044 (JP), filed on Mar. 25, 2019.
Prior Publication US 2022/0153606 A1, May 19, 2022
Int. Cl. C01G 41/04 (2006.01); B01D 3/14 (2006.01)
CPC C01G 41/04 (2013.01) [B01D 3/14 (2013.01)] 20 Claims
 
1. A method of manufacturing tungsten hexafluoride, comprising:
a reaction step comprising reacting tungsten containing arsenic or an arsenic compound with a gas of a fluorine element-containing compound, so as to obtain a mixture comprising tungsten hexafluoride and a trivalent arsenic compound; and
a distillation step comprising distilling and purifying the mixture so as to separate and remove a first fraction comprising the trivalent arsenic compound and to obtain tungsten hexafluoride.