	US 12,304,823 B2
	Precipitated silica and process for its manufacture
Emmanuelle Allain Najman, L'hay les Roses (FR); Cédric Feral-Martin, Emerainville (FR); Pascaline Garbey, Saint Didier Au Mont d'or (FR); Laurent Guy, Rillieux-la-Pape (FR); Sylvaine Neveu, Paris (FR); and Caroline Fayolle, Lyons (FR)
Assigned to RHODIA OPERATIONS, Paris (FR)
Filed by RHODIA OPERATIONS, Paris (FR)
Filed on Dec. 3, 2020, as Appl. No. 17/111,206.
Application 17/111,206 is a division of application No. 16/611,171, previously published as PCT/EP2018/061310, filed on May 3, 2018.
Claims priority of application No. 17305512 (EP), filed on May 5, 2017.
Prior Publication US 2021/0087068 A1, Mar. 25, 2021
Int. Cl. C01B 33/193 (2006.01)

CPC C01B 33/193 (2013.01) [C01P 2006/12 (2013.01)]

11 Claims

1. A precipitated silica comprising silica and

at least one element M selected from the group consisting of B, Al, Ga and mixtures thereof in an amount in a range from 0.5 to 30.0 mol % with respect to moles of the precipitated silica;

wherein the precipitated silica exhibits an infrared absorption spectrum having at least one peak between 1538 and 1559 cm⁻¹and one peak between 1612 and 1635 cm⁻¹, said infrared absorption spectrum having been measured after chemisorption with pyridine to saturation followed by treatment under vacuum at 25° C., wherein an area under the at least one peak between 1538 and 1559 cm⁻¹is at least 0.04 cm⁻¹, the area under the one peak between 1612 and 1635 cm⁻¹is at least 0.05 cm⁻¹, and a ratio (area under the at least one peak between 1538 and 1559 cm⁻¹)/(area under the one peak between 1612 and 1635 cm⁻¹) is less than 0.80.