US 12,304,200 B2
Imprint apparatus, method of controlling imprint apparatus, and storage medium
Hisashi Namba, Tochigi (JP)
Assigned to Canon Kabushiki Kaisha, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Feb. 10, 2023, as Appl. No. 18/167,773.
Claims priority of application No. 2022-021373 (JP), filed on Feb. 15, 2022.
Prior Publication US 2023/0256731 A1, Aug. 17, 2023
Int. Cl. B41J 2/045 (2006.01); B41J 2/21 (2006.01); B41J 25/00 (2006.01); G03F 7/00 (2006.01)
CPC B41J 2/0451 (2013.01) [B41J 2/04581 (2013.01); B41J 2/04586 (2013.01); B41J 2/2139 (2013.01); B41J 2/2142 (2013.01); B41J 25/001 (2013.01); G03F 7/0002 (2013.01)] 12 Claims
OG exemplary drawing
 
1. An imprint apparatus comprising:
a discharge unit including a nozzle array in which a plurality of nozzles are arranged in a nozzle array direction;
a moving unit configured to move relative positions of a substrate and the discharge unit; and
a discharge control unit configured to perform control so as to apply a resin to the substrate by applying a resin from a nozzle corresponding to a predetermined cycle in the nozzle array direction in the discharge unit and by moving the relative positions by the moving unit, the imprint apparatus comprising:
an identifying unit configured to identify a discharging defective nozzle in the discharge unit; and
a complementing unit configured to, in a case where the nozzle corresponding to the predetermined cycle includes a discharging defective nozzle, complement the discharging defective nozzle with an alternative nozzle near the discharging defective nozzle,
wherein the complementing unit determines a nozzle to be used for discharge so that there is at least one location where a cycle of nozzles applying a resin in the nozzle array direction is n−1 in a case where the predetermined cycle is n, and the resin is applied to another location in the predetermined cycle n, and
wherein the complementing unit determines a nozzle applying the resin without changing a position of a resin near a mesa edge.
 
11. A method of controlling an imprint apparatus comprising:
a discharge unit including a nozzle array in which a plurality of nozzles are arranged in a nozzle array direction;
a moving unit configured to move relative positions of a substrate and the discharge unit; and
a discharge control unit configured to perform control so as to apply a resin to the substrate by applying a resin from a nozzle corresponding to a predetermined cycle in the nozzle array direction in the discharge unit and by moving the relative positions by the moving unit, the method comprising:
identifying a discharging defective nozzle in the discharge unit; and
in a case where the nozzle corresponding to the predetermined cycle includes a discharging defective nozzle, complementing the discharging defective nozzle with an alternative nozzle near the discharging defective nozzle,
wherein the complementing comprises determining a nozzle to be used for discharge so that there is at least one location where a cycle in the nozzle array direction is n−1 in a case where the predetermined cycle is n, and the resin is applied to another location in the predetermined cycle n, and
wherein the complementing determines a nozzle applying the resin without changing a position of a resin near a mesa edge.
 
12. A non-transitory computer readable storage medium storing a program which causes a computer to function as a discharge unit including a nozzle array in which a plurality of nozzles are arranged in a nozzle array direction; a moving unit configured to move relative positions of a substrate and the discharge unit; and a discharge control unit configured to perform control so as to apply a resin to the substrate by applying a resin from a nozzle corresponding to a predetermined cycle in the nozzle array direction in the discharge unit and by moving the relative positions by the moving unit, the program causing the computer to function as
an identifying unit configured to identify a discharging defective nozzle in the discharge unit; and
a complementing unit configured to, in a case where the nozzle corresponding to the predetermined cycle includes a discharging defective nozzle, complement the discharging defective nozzle with an alternative nozzle near the discharging defective nozzle,
wherein the complementing unit determines a nozzle to be used for discharge so that there is at least one location where a cycle of nozzles applying a resin in the nozzle array direction is n−1 in a case where the predetermined cycle is n, and the resin is applied to another location in the predetermined cycle n, and
wherein the complementing unit determines a nozzle applying the resin without changing a position of a resin near a mesa edge.