| CPC A61N 5/025 (2013.01) [A61N 1/44 (2013.01)] | 1 Claim |

|
1. A microwave treatment apparatus configured to treat skin or subcutaneous tissues, the microwave treatment apparatus comprising:
an electrode configured to generate microwaves by electricity received from a power supply;
a chamber having a tubular hollow and disposed at a central region of the microwave treatment apparatus configured to expose one end of the electrode towards the skin; and
a gas supply source configured to supply gas to a space between the electrode and an inner wall of the chamber,
wherein the supplied gas is converted into ionized gas by an electric field having frequencies of the microwaves generated by the electrode, and the microwave treatment apparatus is configured to supply the ionized gas to the skin so that the skin is exposed to the ionized gas,
wherein temperature of the ionized gas is equal to or less than 50° C.,
wherein the ionized gas is configured to treat a region of the skin having a depth less than 10 mm,
wherein a flow frequency of the ionized gas is repeatedly modulated from a lower level to a higher level with 0.001-10 Hz,
wherein a subsidiary gas supply source is further disposed at one side of the microwave treatment apparatus,
wherein a nozzle is disposed adjacent to an open end of the chamber, a valve is disposed on a gas line between the nozzle and the subsidiary gas supply source, and an outlet of the nozzle is configured to be disposed to head towards an intersection between the skin and a central axis of the chamber, the central axis of the chamber being configured to be disposed between the electrode and the skin,
wherein at least one light source configured to radiate light to the skin comprises a first light source and a second light source,
wherein the first light source is installed on a light source holder integrated with one side of the chamber,
wherein the second light source is configured to be installed at one end of the chamber opposite to the skin, a light-transmitting glass plate is installed at the one end of the chamber, a lens is installed at the one end of the chamber, and the lens is installed between the second light source and the light-transmitting glass plate,
wherein the microwave treatment apparatus is configured to be installed in a treatment apparatus holder, and the treatment apparatus holder is installed to be supported by an assembly base so as to be movable vertically and to be movable horizontally in an arc shape, and
wherein the treatment apparatus holder is installed so as to be movable horizontally in the arch shape along an arc-shaped rail, and elevating slides are installed at both ends of the arc-shaped rail so as to move the treatment apparatus holder vertically, and are combined, so as to be movable vertically, with an open front part of the assembly base having an inner space configured such that a human body is placed therein.
|