US D1,027,166 S
Face mask
Sheng Zhou, Shanghai (CN); Xiaojin Han, Shanghai (CN); Hongbing Xiang, Shanghai (CN); Weifeng Shen, Shanghai (CN); Teicheng Qu, Shanghai (CN); and ZhaoXia Jin, Shanghai (CN)
Assigned to HONEYWELL INTERNATIONAL INC., Charlotte, NC (US)
Filed by Honeywell International Inc., Charlotte, NC (US)
Filed on Oct. 28, 2021, as Appl. No. 29/813,375.
Term of patent 15 Years
LOC (14) Cl. 29 - 02
U.S. Cl. D24—110.1
OG exemplary drawing
 
We claim the ornamental design for a face mask, as shown and described.