Seal for an assembly in a vapor deposition chamber
Yao-Hung Yang, Santa Clara, CA (US); Eric Ruhland, Pleasanton, CA (US); Saurabh M. Chaudhari, San Jose, CA (US); Dien-Yeh Wu, San Jose, CA (US); Philip Wayne Nagle, Austin, TX (US); Aniruddha Pal, San Jose, CA (US); Sudhir R. Gondhalekar, Pleasanton, CA (US); Siamak Salimian, Los Altos, CA (US); Scott Lin, Hsinchu (TW); and Boon Sen Chan, North Singapore (SG)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Dec. 17, 2020, as Appl. No. 29/762,536.
Term of patent 15 Years
LOC (14) Cl. 23 - 01
U.S. Cl. D23—269
The ornamental design for a seal for an assembly in a vapor deposition chamber, as shown and described.