US 11,984,598 B2
Ion conductive layer and methods of forming
Ruofan Wang, Natick, MA (US); Yuto Takagi, Natick, MA (US); Michael McGahan, Middletown, RI (US); Vladimir Ouspenski, Saint-Pierre-lès-Nemours (FR); Gaurav Assat, Paris (FR); and Chuanping Li, Shrewsbury, MA (US)
Assigned to SAINT-GOBAIN CERAMICS & PLASTICS, INC., Worcester, MA (US)
Filed by SAINT-GOBAIN CERAMICS & PLASTICS, INC., Worcester, MA (US)
Filed on Jun. 21, 2023, as Appl. No. 18/338,781.
Application 18/338,781 is a continuation of application No. 17/239,121, filed on Apr. 23, 2021, granted, now 11,735,732.
Claims priority of provisional application 63/014,231, filed on Apr. 23, 2020.
Prior Publication US 2023/0352688 A1, Nov. 2, 2023
Int. Cl. H01M 4/36 (2006.01); H01M 4/505 (2010.01); H01M 4/60 (2006.01); H01M 4/62 (2006.01); H01M 10/0525 (2010.01); H01M 10/0565 (2010.01); H01M 4/02 (2006.01)
CPC H01M 4/60 (2013.01) [H01M 4/366 (2013.01); H01M 4/505 (2013.01); H01M 4/623 (2013.01); H01M 10/0525 (2013.01); H01M 10/0565 (2013.01); H01M 2004/021 (2013.01); H01M 2300/0082 (2013.01); H01M 2300/0085 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A layer, comprising:
a solid ion conductive material including a halide-based material represented by formula M3−δ(Mek+)fX3−δ+k*f, wherein −3≤δ<3, 0≤f≤1, k is the valence of Me, 2≤k<6, M includes Li, Me includes a metal element that is different from M, and X includes a halogen, wherein the halide-based material includes at least two metal elements; and
an organic material including poly(vinylidene fluoride), polyisobutylene, or a combination thereof, wherein when the layer comprises a further organic material, the further organic material has a dielectric constant of at most 12,
wherein the solid ion conductive material is at least 50 vol % for a total volume of the layer.
 
9. A layer, comprising:
a solid ion conductive material including a halide-based material represented by formula M3−δ(Mek+)fX3−δ+k*f, wherein −3≤δ<3, 0≤f≤1, k is the valence of Me, 2≤k<6, M includes Li, Me includes a metal element that is different from M, and X includes a halogen, wherein the halide-based material includes at least two metal elements;
a cathode material; and
an organic material including a polymer including a fluoro group, chloro group, or any combination thereof, wherein the polymer has a dielectric constant of at most 12,
wherein the polymer material is at most 10 wt % for a total weight of the layer.
 
19. A composition, comprising:
a solid ion conductive material including a halide-based material represented by formula M3−δ(Mek+)fX3−δ+k*f, wherein −3≤δ<3, 0≤f≤1, k is the valence of Me, 2≤k<6, M includes Li, Me includes a metal element that is different from M, and X includes a halogen, wherein the halide-based material includes at least two metal elements; and
an organic material including poly(vinylidene fluoride), polyvinyl chloride, poly(vinylidene fluoride-co-hexafluoropropylene), polyisobutylene, or a combination thereof, wherein when the layer comprises a further organic material, the further organic material has a dielectric constant of at most 12,
wherein the solid ion conductive material is at least 50 vol % for a total volume of the layer.