US 11,984,467 B2
Image sensor and image sensing device
Dae Shik Kim, Hwaseong-si (KR); Min-Sun Keel, Seoul (KR); and Sang Kil Lee, Seongnam-si (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed on Jul. 6, 2021, as Appl. No. 17/368,112.
Claims priority of application No. 10-2020-0144925 (KR), filed on Nov. 3, 2020.
Prior Publication US 2022/0139991 A1, May 5, 2022
Int. Cl. H01L 27/146 (2006.01); H01L 25/065 (2023.01); H10B 61/00 (2023.01)
CPC H01L 27/14636 (2013.01) [H01L 25/0657 (2013.01); H01L 27/1462 (2013.01); H01L 27/14634 (2013.01); H10B 61/00 (2023.02)] 19 Claims
OG exemplary drawing
 
1. An image sensor, comprising:
an upper chip including a pixel array and a first connecting structure, the first connecting structure being connected to the pixel array; and
a lower chip below the upper chip, the lower chip including:
a second connecting structure connected to the first connecting structure, the second connecting structure having:
a first metal layer,
a second metal layer on the first metal layer, the second metal layer having a same thickness as the first metal layer,
a third metal layer on the second metal layer, the third metal layer being thicker than the second metal layer,
a fourth metal layer on the third metal layer, the fourth metal layer being thicker than the third metal layer,
a first insulating layer between the first and second metal layers,
a second insulating layer between the second and third metal layers, and
a third insulating layer between the third and fourth metal layers,
a first memory device having a first magnetic tunnel junction (MTJ) element, the first MTJ element being in at least one of the first and second insulating layers, and
a second memory device having a second MTJ element different from the first MTJ element, the second MTJ element being in at least one of the first through third insulating layers,
wherein a single first memory device has a larger storage capacity than a single second memory device.