| CPC H01L 21/68742 (2013.01) [H01L 21/68785 (2013.01)] | 3 Claims |
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1. A substrate processing apparatus including:
a chamber;
a chuck disposed in the chamber, and the chuck including a plurality of pin holes;
a plurality of lift pins positioned to rise and fall through the plurality of pin holes;
a lift plate configured to raise and lower the plurality of lift pins,
a first lift pin included among the plurality of lift pins, the first lift pin having a rod shape, the first lift pin being configured to move up and down within a pin hole of the plurality of pin holes;
a first metal plate disposed below the first lift pin;
a weight block having a first magnet disposed on top, the weight block coupled to a lower portion of the first lift pin;
a weight body positioned beneath the lift plate; and
a weight string connecting the weight block and the weight body,
wherein the lift plate includes a string hole through which the weight string is configured to pass through.
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