US 11,984,308 B2
Method for measuring concentration of fluorine gas in halogen fluoride-containing gas using mass spectrometer
Atsushi Suzuki, Tokyo (JP)
Assigned to Resonac Corporation, Tokyo (JP)
Appl. No. 17/608,527
Filed by SHOWA DENKO K.K., Tokyo (JP)
PCT Filed Nov. 12, 2020, PCT No. PCT/JP2020/042274
§ 371(c)(1), (2) Date Nov. 3, 2021,
PCT Pub. No. WO2021/106601, PCT Pub. Date Jun. 3, 2021.
Claims priority of application No. 2019-214260 (JP), filed on Nov. 27, 2019.
Prior Publication US 2022/0223397 A1, Jul. 14, 2022
Int. Cl. H01J 49/04 (2006.01); H01J 49/00 (2006.01); H01J 49/40 (2006.01)
CPC H01J 49/0422 (2013.01) [H01J 49/0031 (2013.01); H01J 49/40 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A method for measuring a concentration of fluorine gas (F2) contained in a halogen fluoride-containing gas by using an analysis apparatus having a halogen fluoride-containing gas supply source, a fluorine-containing gas supply source, a tube, a capillary, and a mass spectrometer,
the method comprising:
before measuring the concentration of fluorine gas, performing passivation treatment on the tube and the capillary by using a passivation gas containing a fluorine-containing gas supplied from the fluorine-containing gas supply source.