US 11,984,302 B2
Magnetic-material shield around plasma chambers near pedestal
Job George Konnoth Joseph, Kerala (IN); Sathya Swaroop Ganta, Sunnyvale, CA (US); Kallol Bera, Fremont, CA (US); Andrew Nguyen, San Jose, CA (US); Jay D. Pinson, II, San Jose, CA (US); Akshay Dhanakshirur, Hubli (IN); Kaushik Comandoor Alayavalli, Sunnyvale, CA (US); Canfeng Lai, Fremont, CA (US); Ren-Guan Duan, Fremont, CA (US); Jennifer Y. Sun, Mountain View, CA (US); Anil Kumar Kalal, Bengaluru (IN); and Abhishek Pandey, Buxar (IN)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Nov. 3, 2020, as Appl. No. 17/088,407.
Prior Publication US 2022/0139679 A1, May 5, 2022
Int. Cl. H01J 37/32 (2006.01); H01J 37/20 (2006.01)
CPC H01J 37/32669 (2013.01) [H01J 37/20 (2013.01); H01J 2237/0264 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A plasma chamber, comprising:
a chamber body having a processing region therewithin;
a liner disposed on the chamber body, the liner surrounding the processing region;
a substrate support disposed within the liner;
a magnet assembly comprising a plurality of magnets disposed around the liner; and
a magnetic-material shield disposed around the liner, the magnetic-material shield encapsulating the processing region near the substrate support;
wherein the magnetic-material shield is of a cylindrical shape extending in a direction of a length of the chamber body and has a length of between 2 inches and 10 inches in the direction of the length of the chamber body;
wherein the magnetic material shield is disposed at a distance from the magnet assembly in the direction of the length of the chamber body; and
wherein the magnetic material shield is movable to provide further tunability for a plasma density profile in the processing region.