US 11,983,475 B2
Method for manufacturing a cell having pins and semiconductor device based on same
Pin-Dai Sue, Hsinchu (TW); Po-Hsiang Huang, Hsinchu (TW); Fong-Yuan Chang, Hsinchu (TW); Chi-Yu Lu, Hsinchu (TW); Sheng-Hsiung Chen, Hsinchu (TW); Chin-Chou Liu, Hsinchu (TW); Lee-Chung Lu, Hsinchu (TW); Yen-Hung Lin, Hsinchu (TW); Li-Chun Tien, Hsinchu (TW); and Yi-Kan Cheng, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed on Feb. 7, 2023, as Appl. No. 18/165,411.
Application 18/165,411 is a continuation of application No. 17/339,162, filed on Jun. 4, 2021, granted, now 11,574,107.
Application 17/339,162 is a continuation of application No. 16/659,351, filed on Oct. 21, 2019, granted, now 11,030,372, issued on Jun. 8, 2021.
Claims priority of provisional application 62/753,296, filed on Oct. 31, 2018.
Prior Publication US 2023/0195991 A1, Jun. 22, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. G06F 30/00 (2020.01); G06F 30/373 (2020.01); G06F 30/392 (2020.01); G06F 30/394 (2020.01); G06F 111/20 (2020.01)
CPC G06F 30/392 (2020.01) [G06F 30/373 (2020.01); G06F 30/394 (2020.01); G06F 2111/20 (2020.01)] 20 Claims
OG exemplary drawing
 
1. A semiconductor device comprising:
a transistor layer that overlays a substrate layer;
M*1st conductors extending in a first direction, being in a first layer of metallization (M*1st layer) that overlays the transistor layer and being aligned correspondingly along alpha tracks,
the M*1st conductors including first and second input pins aligned to different corresponding ones of the alpha tracks and representing corresponding inputs of a cell region, the cell region representing at least part of a circuit in the semiconductor device; and
M*2nd conductors extending in a second direction perpendicular to the first direction, being in a second layer of metallization (M*2nd layer) that overlays the M*1st layer and being aligned correspondingly along beta tracks, and the M*2nd conductors including at least one power grid (PG) segment and one or more of an output pin or a routing segment; and
each of the first and second input pins having a length in the first direction sufficient to accommodate at most two access points;
each of the access points of the first and second input pins being aligned to a corresponding different one of first, second, third and fourth ones of beta tracks (first to fourth beta tracks); and
the PG segment being aligned with one of the first to fourth beta tracks.