a plurality of first light sources configured to generate first light source light having a first spectral power distribution in a first operational mode, the first light source light having at least a plurality of wavelengths in a first wavelength range of 380-780 nm, and are configured in a first array having a first pitch (P1);

a plurality of second light sources are configured to generate second light source light having a second spectral power distribution in the first operational mode, the second spectral power distribution differing from the first spectral power distribution, the second light source light having at least intensity at one or more wavelengths in a second wavelength range of 470-490 nm, and are configured in a second array having a second pitch (P2); and

a plurality of beam shaping elements configured to beam shape at least the first light source light, the beam shaping elements configured in a third array having a third pitch (P3), and the beam shaping elements having a first diameter (D);

wherein:

P1=P3 and P2≥P1,

the light generating system is configured to provide in the first operational mode white first system light in a first direction and second system light in a second direction,

the first system light has a first ratio R1 of luminous flux in the second wavelength range relative to the luminous flux in the first wavelength range,

the second system light has a second ratio R2 of luminous flux in the second wavelength range relative to the luminous flux in the first wavelength range, and

under a first angle (α1) relative to the light generating system the first ratio R1 is selected from the range of 0.01-0.15, under a second angle (α2) relative to the light generating system the second ratio R2 is selected from the range of 0.2-15, the second angle is larger than the first angle, and the ratio R2/R1>1.