US 11,981,595 B2
Burner for producing glass fine particle deposited body, and device and method for producing glass fine particle deposited body
Tomomi Moriya, Osaka (JP)
Assigned to SUMITOMO ELECTRIC INDUSTRIES, LTD., Osaka (JP)
Appl. No. 17/298,820
Filed by SUMITOMO ELECTRIC INDUSTRIES, LTD., Osaka (JP)
PCT Filed Dec. 4, 2019, PCT No. PCT/JP2019/047455
§ 371(c)(1), (2) Date Jun. 1, 2021,
PCT Pub. No. WO2020/116521, PCT Pub. Date Jun. 11, 2020.
Claims priority of application No. 2018-227117 (JP), filed on Dec. 4, 2018.
Prior Publication US 2022/0017403 A1, Jan. 20, 2022
Int. Cl. C03B 37/014 (2006.01)
CPC C03B 37/0142 (2013.01) [C03B 2207/12 (2013.01); C03B 2207/32 (2013.01); C03B 2207/52 (2013.01)] 1 Claim
OG exemplary drawing
 
1. A method for producing a glass fine particle deposited body, which produces the glass fine particle deposited body by depositing a glass fine particle on a starting rod disposed inside a reaction vessel, the method comprising:
providing a through hole through which a burner passes on a wall surface of a wall portion disposed to be separated from the starting rod, the burner being provided with metallic gas supply pipes as a main body of the burner and a cover that covers the metallic gas supply pipes in an integrated manner, a pipe for supplying raw material gas, a pipe for supplying oxyhydrogen gas, and a pipe for supplying seal gas are connected to a respective metallic gas supply pipe of the metallic gas supply pipes, the cover covering an entire length of the metallic gas supply pipes and a connection portion of the metallic gas supply pipes connected to a side surface of the metallic gas supply pipes with a predetermined length in an axial direction of the burner and a given constant outer diameter;
retracting the burner while keeping a gap with the through hole a given constant length as the glass fine particle deposited body grows; and
introducing clean air into the reaction vessel through the gap,
wherein octamethylcyclotetrasiloxane (OMCTS) is used as a raw material and the metallic gas supply pipes are heated to 230° C. or higher.