CPC C03B 19/066 (2013.01) [C03B 19/1453 (2013.01); C03C 1/022 (2013.01); C03C 3/06 (2013.01); C03B 25/00 (2013.01); C03B 2201/04 (2013.01); C03C 2201/02 (2013.01); C03C 2203/10 (2013.01); C03C 2203/40 (2013.01); C03C 2204/00 (2013.01)] | 9 Claims |
1. A method for preparing quartz glass with low content of hydroxyl and high purity, comprising:
preparing silica powders, the silica powders comprising hydroxyl groups;
dehydroxylating the silica powders, comprising:
adjusting a temperature of a furnace to a first temperature and drying the silica powders in the furnace at the first temperature;
raising the temperature of the furnace up to a second temperature and introducing a first oxidizing gas comprising halogen gas into the furnace, a total mass of the introduced first oxidizing gas being within 1% of a total mass of the silica powders, thereby heating the silica powers at the second temperature and obtaining first dehydroxylated powders;
raising the temperature of the furnace up to a third temperature and introducing a second oxidizing gas comprising oxygen or ozone into the furnace, thereby heating the silica powers at the third temperature and obtaining second dehydroxylated powders;
heating the second dehydroxylated powders up to a fourth temperature to vitrify the second dehydroxylated powders, thereby obtaining a vitrified body; and
cooling the vitrified body to obtain the quartz glass.
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