US 11,981,085 B2
Multi-source overlap design acceptance qualification
Lisa M. Smith, Plano, TX (US); Nicholas C. Day, Tucson, AZ (US); and Jacob H. Steinberg, Rosamond, CA (US)
Assigned to Raytheon Company, Tewksbury, MA (US)
Filed by Raytheon Company, Waltham, MA (US)
Filed on Jul. 20, 2021, as Appl. No. 17/381,053.
Prior Publication US 2023/0024156 A1, Jan. 26, 2023
Int. Cl. B29C 64/393 (2017.01); B29C 64/153 (2017.01); B29C 64/245 (2017.01); B29C 64/40 (2017.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 50/02 (2015.01)
CPC B29C 64/393 (2017.08) [B29C 64/153 (2017.08); B29C 64/245 (2017.08); B29C 64/40 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12)] 21 Claims
OG exemplary drawing
 
8. An apparatus comprising:
at least one processor configured to control an additive manufacturing system in order to fabricate a three-dimensional (3D) structure using successive layers of material, wherein the additive manufacturing system comprises:
a build platform having a first region, a second region, and an overlapping third region between the first and second regions; and
multiple sources configured to build the successive layers of material in the first, second, and third regions of the build platform;
wherein, to control the additive manufacturing system, the at least one processor is configured to cause the additive manufacturing system to build first, second, and third portions of the 3D structure respectively within the first, second, and third regions of the build platform such that each of the first, second, and third portions of the 3D structure comprises (i) one or more test features that are common to the first, second, and third portions of the 3D structure and (ii) a substrate onto or into which the one or more common test features are formed; and
wherein, to cause the additive manufacturing system to build the first, second, and third portions of the 3D structure, the at least one processor is configured to:
control a first source calibrated to operate in the first region;
control a second source calibrated to operate in the second region, the second region outside the first region; and
control the first source and the second source calibrated to operate in the overlapping third region.