US 12,300,514 B2
Chemical liquid supply unit and substrate processing apparatus including the same
Seong Soo Lee, Suwon-si (KR); Dong Hee Son, Hwaseong-si (KR); and Moon Sik Choi, Seoul (KR)
Assigned to SEMES CO., LTD., Cheonan-si (KR)
Filed by SEMES CO., LTD., Cheonan-si (KR)
Filed on Mar. 21, 2023, as Appl. No. 18/124,277.
Claims priority of application No. 10-2022-0099137 (KR), filed on Aug. 9, 2022.
Prior Publication US 2024/0055276 A1, Feb. 15, 2024
Int. Cl. H01L 21/67 (2006.01); C02F 1/68 (2023.01)
CPC H01L 21/67017 (2013.01) [C02F 1/68 (2013.01); H01L 21/67051 (2013.01); C02F 2209/05 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A chemical liquid supply unit comprising:
a mixing unit configured to mix deionized water and a CO2 gas to generate a CO2 water;
a first supply unit configured to supply the deionized water to the mixing unit;
a second supply unit configured to supply the CO2 gas to the mixing unit;
a filter member configured to remove foreign substances in the CO2 water mixed by the mixing unit; and
a transfer line configured to transfer the CO2 water from the mixing unit onto a substrate,
wherein the transfer line comprises:
a first section in which the CO2 water flows at a first flow rate; and
a second section in which the CO2 water flows at a second flow rate greater than the first flow rate, and
wherein the filter member is disposed in the first section.