US 12,298,719 B2
Methods and apparatus to calibrate spatial light modulators
Anders Grunnet-Jepsen, San Jose, CA (US); Paul Winer, Richmond, CA (US); and Alexey Supikov, Santa Clara, CA (US)
Assigned to Intel Corporation, Santa Clara, CA (US)
Filed by Intel Corporation, Santa Clara, CA (US)
Filed on Jun. 25, 2021, as Appl. No. 17/359,151.
Prior Publication US 2021/0325828 A1, Oct. 21, 2021
Int. Cl. G01M 11/02 (2006.01); G01J 9/00 (2006.01); G01J 9/02 (2006.01); G03H 1/02 (2006.01); G03H 1/08 (2006.01); G03H 1/22 (2006.01); G09G 3/34 (2006.01); H04N 9/31 (2006.01); H04N 13/327 (2018.01)
CPC G03H 1/2294 (2013.01) [G01J 9/00 (2013.01); G01J 9/02 (2013.01); G01M 11/02 (2013.01); G01M 11/0271 (2013.01); G03H 1/024 (2013.01); G03H 1/0866 (2013.01); G09G 3/3466 (2013.01); H04N 9/3179 (2013.01); H04N 9/3191 (2013.01); H04N 13/327 (2018.05); G03H 2222/12 (2013.01); G03H 2225/23 (2013.01); G03H 2225/32 (2013.01); G03H 2226/02 (2013.01)] 25 Claims
OG exemplary drawing
 
1. An apparatus comprising:
at least one memory;
instructions in the apparatus; and
at least one processor circuit to execute and/or instantiate the instructions to:
provide a greyscale image to a spatial light modulator (SLM), the greyscale image including pixel values that define voltages to be applied to individual pixels of the SLM, the pixel values arranged in a double-slit grating pattern, the SLM to produce an interference pattern based on the double-slit grating pattern;
determine a phase difference between first and second gratings of the double-slit grating pattern based on the interference pattern; and
generate a phase curvature based on the phase difference.