US 12,298,664 B2
Advanced load port for photolithography mask inspection tool
Tung-Jung Chang, Hsinchu (TW); Jen-Yang Chung, Hsinchu (TW); and Han-Lung Chang, Hsinchu (TW)
Assigned to Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Jan. 31, 2024, as Appl. No. 18/429,281.
Application 18/429,281 is a continuation of application No. 18/161,433, filed on Jan. 30, 2023, granted, now 11,921,431.
Application 18/161,433 is a continuation of application No. 17/478,300, filed on Sep. 17, 2021, granted, now 11,592,754, issued on Feb. 28, 2023.
Claims priority of provisional application 63/178,463, filed on Apr. 22, 2021.
Prior Publication US 2024/0168387 A1, May 23, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/00 (2006.01); G03F 1/66 (2012.01); G03F 1/84 (2012.01)
CPC G03F 1/84 (2013.01) [G03F 1/66 (2013.01); G03F 7/70741 (2013.01)] 20 Claims
OG exemplary drawing
 
9. A system comprising:
a photolithography mask inspection tool configured to inspect one or more surfaces of a photolithography mask during a selected period of time;
a mask pod including an inner pod and an outer pod housing the inner pod, the inner pod configured to house the photolithography mask;
a mask pod inspection tool;
an automatic transport tool;
one or more processors being operatively coupled to the photolithography mask inspection tool, the mask pod inspection tool, and the automatic transport tool, the one or more processors configured to:
provide a signal which causes the automatic transport tool to remove the photolithography mask from the mask pod;
provide a signal which causes the automatic transport tool to provide the removed photolithography mask to the photolithography mask inspection tool for inspection during the selected period of time;
provide a signal which causes the automatic transport tool to retrieve the mask pod without the photolithography mask during the selected period of time and deliver the mask pod without the photolithography mask to the mask pod inspection tool; and
provide a signal which causes the mask pod inspection tool to inspect the mask pod without the photolithography mask during the selected period of time.