US 12,298,324 B2
Automatic analysis apparatus and cleaning method for same
Misato Koike, Tokyo (JP); Masashi Akutsu, Tokyo (JP); Masashi Fukaya, Tokyo (JP); and Megumi Kato, Tokyo (JP)
Assigned to HITACHI HIGH-TECH CORPORATION, Tokyo (JP)
Appl. No. 17/601,087
Filed by Hitachi High-Tech Corporation, Tokyo (JP)
PCT Filed Mar. 18, 2020, PCT No. PCT/JP2020/011972
§ 371(c)(1), (2) Date Oct. 4, 2021,
PCT Pub. No. WO2020/230451, PCT Pub. Date Nov. 19, 2020.
Claims priority of application No. 2019-090500 (JP), filed on May 13, 2019.
Prior Publication US 2022/0206029 A1, Jun. 30, 2022
Int. Cl. G01N 35/10 (2006.01); G01N 33/48 (2006.01); G01N 35/00 (2006.01)
CPC G01N 35/1004 (2013.01) [G01N 33/48 (2013.01); G01N 35/00693 (2013.01); G01N 35/00722 (2013.01); G01N 2035/0091 (2013.01)] 24 Claims
OG exemplary drawing
 
8. A cleaning method for an automatic analysis apparatus including:
a dispensing mechanism including a probe configured to dispense a sample or a reagent into a reaction container; a cleaning mechanism configured to clean the probe; and a control unit configured to control the dispensing mechanism and the cleaning mechanism,
wherein the control unit obtains, on the basis of count values indicating weightings to contamination and corresponding to a plurality of analysis conditions, a cumulative count obtained by accumulating the count values for each dispensing of the sample or the reagent, where the analysis conditions include information on contamination ranges both inside and outside the probe, and controls the cleaning mechanism to clean the probe when the cumulative count exceeds a set threshold value.