US 12,297,974 B2
Method and apparatus for generating three-dimensional occultation imaging from slim profile lighting assembly
Rafat Mohmoud Mohammad, Dearborn, MI (US); Frank Hallitschke, Backnang (DE); Helgert Elezi, Saint Clair Shores, MI (US); and Jacob Williams, Ypsilanti, MI (US)
Assigned to Magna Exteriors Inc., Aurora (CA)
Filed by Magna Exteriors Inc., Aurora (CA)
Filed on Sep. 7, 2023, as Appl. No. 18/463,032.
Application 18/463,032 is a continuation of application No. 17/966,386, filed on Oct. 14, 2022, granted, now 11,781,725.
Claims priority of provisional application 63/256,823, filed on Oct. 18, 2021.
Prior Publication US 2023/0417386 A1, Dec. 28, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. F21S 43/14 (2018.01); B60Q 1/00 (2006.01); F21S 43/31 (2018.01)
CPC F21S 43/14 (2018.01) [F21S 43/31 (2018.01); B60Q 1/0023 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A lighting assembly for generating occultation imaging, comprising:
a plurality of light emitting diodes (LEDs) disposed on an illuminator substrate and configured to emit light therefrom;
at least one mask defining an obscuration pattern and configured to obscure some of the light emitted from the plurality of LEDs and to produce unobscured light defining an illumination pattern corresponding to the obscuration pattern; and
a reflection chamber configured to receive the unobscured light and including a first reflective layer and a second reflective layer defining an interior chamber therebetween, wherein each of the first reflective layer and the second reflective layer is at least partially reflective to the light from the plurality of LEDs, and wherein the reflection chamber is configured to generate multiple reflections of the unobscured light wherein the second reflective layer includes a metallic layer disposed on a reflector substrate and is configured to reflect some of the unobscured light back toward the first reflective layer and to pass some of the unobscured light therethrough to exit from the lighting assembly and to present multiple instances of the illumination pattern that are offset in one or more spatial dimensions, and
wherein the at least one mask is located between the illuminator substrate and the interior chamber.