US 12,297,538 B2
High registration particles-transferring system
Yunda Wang, Milpitas, CA (US); Sourobh Raychaudhuri, Mountain View, CA (US); JengPing Lu, Fremont, CA (US); Eugene M. Chow, Palo Alto, CA (US); Julie A. Bert, East Palo Alto, CA (US); David Biegelsen, Portola Valley, CA (US); George A. Gibson, Fairport, NY (US); and Jamie Kalb, Mountain View, CA (US)
Assigned to Xerox Corporation, Norwalk, CT (US)
Filed by Xerox Corporation, Norwalk, CT (US)
Filed on Jul. 12, 2023, as Appl. No. 18/221,302.
Application 16/781,813 is a division of application No. 15/591,959, filed on May 10, 2017, granted, now 10,604,843, issued on Mar. 31, 2020.
Application 18/221,302 is a continuation of application No. 16/781,813, filed on Feb. 4, 2020, granted, now 11,732,362.
Prior Publication US 2023/0366093 A1, Nov. 16, 2023
Int. Cl. H01L 21/67 (2006.01); B05B 5/00 (2006.01); B05D 1/00 (2006.01); B81B 3/00 (2006.01); C23C 16/50 (2006.01); H01L 23/00 (2006.01)
CPC C23C 16/50 (2013.01) [B05B 5/00 (2013.01); B05D 1/00 (2013.01); B81B 3/0018 (2013.01); H01L 21/67271 (2013.01); H01L 21/67282 (2013.01); H01L 21/67294 (2013.01); H01L 24/75 (2013.01); H01L 24/95 (2013.01); H01L 2224/95001 (2013.01); H01L 2224/95101 (2013.01); H01L 2224/95115 (2013.01); H01L 2224/95144 (2013.01); H01L 2224/95145 (2013.01); H01L 2924/10253 (2013.01); H01L 2924/1434 (2013.01); H01L 2924/1461 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A particle-transferring system comprising:
a first substrate comprising a first surface configured to support a plurality of particles in a non-uniform pattern;
a particle transfer unit comprising a transfer substrate having an outer surface configured to be offset from the first surface by a first gap, wherein the particle transfer unit is configured to remove the plurality of particles from the first surface in response to the plurality of particles being within the first gap; and
a second substrate comprising a second surface configured to be offset from the outer surface of the transfer substrate by a second gap, wherein the second substrate is configured to remove the plurality of particles from the particle transfer unit and secure the plurality of particles to the second surface in response to the plurality of particles being within the second gap; and
one or more spacers attached to the particle transfer unit and configured to provide the first gap between the first substrate and the transfer substrate and provide the second gap between the second substrate and the transfer substrate,
wherein the particle transfer unit is configured to transfer the plurality of particles and maintain the non-uniform pattern regardless of positions of the plurality of particles, which are not predefined to fit features of the particle transfer unit.