US 12,297,533 B2
Liquid precursor vapor pressure control
Michael Schmotzer, Chandler, AZ (US)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP Holding B.V., Almere (NL)
Filed on Jun. 23, 2022, as Appl. No. 17/847,306.
Claims priority of provisional application 63/215,662, filed on Jun. 28, 2021.
Prior Publication US 2022/0411925 A1, Dec. 29, 2022
Int. Cl. C23C 16/448 (2006.01); B01J 7/00 (2006.01)
CPC C23C 16/4481 (2013.01) [B01J 7/00 (2013.01); B01J 2219/00094 (2013.01); B01J 2219/00146 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A source vessel for a semiconductor processing system, the source vessel comprising:
a housing defining a chamber for holding a liquid-state precursor; and
a temperature sensor configured to detect a temperature of a surface of the liquid-state precursor contained within the chamber of the housing; wherein:
the temperature sensor is a floating temperature measurement device configured to float on the surface of the liquid-state precursor; and
the source vessel further comprises a vertical guidance rod vertically disposed within the chamber of the housing, wherein the floating temperature measurement device is moveably coupled to the vertical guidance rod such that the floating temperature measurement device is configured to move along the guidance rod in response to liquid level changes of the liquid-state precursor.