US 12,295,089 B2
Active gas generation apparatus
Ren Arita, Tokyo (JP); and Kensuke Watanabe, Tokyo (JP)
Assigned to TMEIC CORPORATION, Tokyo (JP)
Appl. No. 17/442,136
Filed by Toshiba Mitsubishi-Electric Industrial Systems Corporation, Tokyo (JP)
PCT Filed Feb. 27, 2020, PCT No. PCT/JP2020/007951
§ 371(c)(1), (2) Date Sep. 23, 2021,
PCT Pub. No. WO2021/171462, PCT Pub. Date Sep. 2, 2021.
Prior Publication US 2022/0174807 A1, Jun. 2, 2022
Int. Cl. H05H 1/00 (2006.01); H05H 1/24 (2006.01)
CPC H05H 1/2425 (2021.05) 18 Claims
OG exemplary drawing
 
1. An active gas generation apparatus comprising:
a first electrode component that includes a first electrode conductive film; and
a second electrode component that includes a second electrode conductive film, the second electrode component being provided to face the first electrode component, wherein an active gas is obtained by activating a source gas supplied to a discharge space between the first electrode component and the second electrode component,
wherein the discharge space is defined as a region where the first and the second electrode conductive films overlap in a plan view, in which an AC voltage is applied between the first and the second electrode conductive films,
wherein the first electrode component further includes
a first main dielectric film, the first main dielectric film being provided on a side of the discharge space with respect to the first electrode conductive film, and being adjacent to the first electrode conductive film, and
a first additional dielectric film, the first additional dielectric film being provided on a side of the discharge space with respect to the first main dielectric film, at a first distance with respect to the first main dielectric film, in which a first additional dielectric space is provided between the first main dielectric film and the first additional dielectric film,
wherein the first additional dielectric space is set such that a dielectric barrier discharge is not caused in the first additional dielectric space when the dielectric barrier discharge is caused in the discharge space,
wherein the first main dielectric film overlaps the first electrode conductive film in a plan view, and has a formation area larger than the first electrode conductive film, and
wherein the first additional dielectric film overlaps the first electrode conductive film in a plan view, and has a formation area larger than the first electrode conductive film and smaller than the first main dielectric film.