US 12,293,937 B2
Plasma processing apparatus and mounting table thereof
Yohei Uchida, Miyagi (JP); and Jun Hirose, Miyagi (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed by TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed on Sep. 29, 2022, as Appl. No. 17/956,110.
Application 17/956,110 is a continuation of application No. 16/737,267, filed on Jan. 8, 2020, granted, now 11,501,995.
Claims priority of application No. 2019-001971 (JP), filed on Jan. 9, 2019.
Prior Publication US 2023/0020793 A1, Jan. 19, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01L 21/687 (2006.01); H01J 37/32 (2006.01); H01L 21/683 (2006.01)
CPC H01L 21/68742 (2013.01) [H01J 37/32642 (2013.01); H01J 37/32715 (2013.01); H01L 21/6831 (2013.01); H01L 21/68735 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/334 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A plasma processing system comprising:
a plasma processing chamber;
an electrostatic chuck disposed in the plasma processing chamber, the electrostatic chuck having a substrate placing portion and an annular portion surrounding the substrate placing portion;
an edge ring made of Si or SiC, the edge ring being disposed so as to surround a substrate to be disposed on the substrate placing portion of the electrostatic chuck, the edge ring having an inner annular portion and an outer annular portion, the inner annular portion of the edge ring being disposed on the annular portion of the electrostatic chuck, the outer annular portion of the edge ring having a recess at a lower face of the outer annular portion;
a cover ring made of quartz, the cover ring having an inner annular portion and an outer annular portion, the inner annular portion of the cover ring being configured to support the outer annular portion of the edge ring, the inner annular portion of the cover ring having a plurality of through holes, each through hole having a downwardly flaring bottom opening defined by a funnel wall, an outer diameter of the cover ring being greater than an outer diameter of the edge ring, the inner annular portion of the cover ring having a protrusion at an upper face of the inner annular portion, the protrusion of the cover ring being configured to engage with the recess of the edge ring to form a positioning structure;
a plurality of lifter pins corresponding to the plurality of through holes, respectively, each lifter pin having a first holding part, a second holding part and a protruding part, the first holding part being an upper portion that fits through a respective one of the through holes of the cover ring, the second holding part being a lower portion and the protruding part having a shape that corresponds to the downwardly flaring bottom opening of the respective through hole;
at least one driving mechanism configured to vertically move the plurality of lifter pins; and
an insulating member, the insulating member having an outer diameter larger than the outer diameter of the cover ring, wherein
a portion of the insulating member is below the cover ring such that an outer peripheral portion of the cover ring covers the portion of the insulating member while an inner peripheral portion of the cover ring is covered by the edge ring,
each protruding part is configured to be brought into contact with a bottom surface of the respective through hole when the lifter pins are raised, and
the insulating member supports the outer annular portion of the cover ring.