US 12,293,904 B2
Substrate processing apparatus, substrate processing method, gas regeneration system, and gas regeneration method
Horoyuki Mizuno, Kuwana (JP)
Assigned to Kioxia Corporation, Tokyo (JP)
Filed by Kioxia Corporation, Tokyo (JP)
Filed on Sep. 2, 2021, as Appl. No. 17/465,115.
Claims priority of application No. 2021-034727 (JP), filed on Mar. 4, 2021.
Prior Publication US 2022/0285141 A1, Sep. 8, 2022
Int. Cl. H01J 37/32 (2006.01); H01L 21/3213 (2006.01)
CPC H01J 37/32844 (2013.01) [H01J 37/3244 (2013.01); H01J 37/32495 (2013.01); H01L 21/32136 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A gas regeneration method comprising:
setting a predetermined standard on a basis of a flow rate of rare gas set in a processing recipe;
selecting a rare gas recovery step on a basis of the predetermined standard;
in the rare gas recovery step, guiding emission gas from a predetermined chamber to a rare gas regenerator, and separating a rare gas from the emission gas at the rare gas regenerator to collect the rare gas through a recovery pipe in a recovery container and to discharge the separated emission gas through an exhaust pipe to an outside; and
in a step other than the rare gas recovery step, causing the emission gas to bypass the rare gas regenerator to discharge the emission gas to the outside, wherein
setting the predetermined standard includes
determining rare gas usage for each step of the processing recipe,
adding up the rare gas usage for each step to determine total usage,
calculating a utilization rate of the usage for each step to the total usage, and
setting a standard utilization rate on a basis of the calculated utilization rate, and selecting the rare gas recovery step includes
selecting, as the rare gas recovery step, a step in which the utilization rate is equal to or greater than the standard utilization rate, and not selecting, as the rare gas recovery step, a step in which the utilization rate is smaller than the standard utilization rate.