US 12,292,690 B2
Insert for a source chamber of an EUV radiation source
Michael Hagg, Essingen (DE); Juan Jose Hasbun Wood, Bruckmühl (DE); Iris Pilch, Aalen (DE); and Christof Metzmacher, Aalen (DE)
Assigned to Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed by Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed on Jul. 14, 2022, as Appl. No. 17/864,939.
Claims priority of application No. 102021207565.7 (DE), filed on Jul. 15, 2021.
Prior Publication US 2023/0019744 A1, Jan. 19, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70033 (2013.01) 20 Claims
OG exemplary drawing
 
1. An insert for a source chamber of an EUV radiation source for producing a beam with EUV radiation, the insert comprising:
1.1. a first region extending in a beam exit direction, and
1.2. a second region extending in a beam exit direction,
1.3. wherein in each case an inner surface delimits a beam passage channel on the circumferential side in the regions,
1.4. wherein the second region serves for delimiting a maximally possible beam geometry,
1.5. wherein the first region serves for producing and/or maintaining a pressure difference on opposite sides of the insert during the operation of the EUV radiation source,
1.6. wherein the second region is arranged with an offset in relation to the first region in the beam exit direction, and
1.7. wherein the first region is embodied such that it has a specified minimum distance from a smallest outer envelope around the maximally possible beam geometry defined by the second region.