US 12,292,689 B2
Alkaline cleaning composition, cleaning method, and manufacturing method of semiconductor
Hui-yi Tang, Taichung (TW); Tzu-chi Wang, Taichung (TW); Yu-nung Chen, Taichung (TW); and Yi-cheng Chen, Taichung (TW)
Assigned to Daxin materials corporation, Taichung (TW)
Filed by Daxin materials corporation, Taichung (TW)
Filed on Dec. 23, 2021, as Appl. No. 17/561,603.
Claims priority of application No. 109146082 (TW), filed on Dec. 24, 2020.
Prior Publication US 2022/0206394 A1, Jun. 30, 2022
Int. Cl. C11D 3/30 (2006.01); C11D 3/20 (2006.01); C11D 3/28 (2006.01); C11D 3/43 (2006.01); C11D 3/44 (2006.01); C11D 7/32 (2006.01); C11D 7/50 (2006.01); G03F 7/32 (2006.01)
CPC G03F 7/322 (2013.01) [C11D 3/2068 (2013.01); C11D 3/28 (2013.01); C11D 3/30 (2013.01); C11D 3/43 (2013.01); C11D 7/3209 (2013.01); C11D 7/3218 (2013.01); C11D 7/3281 (2013.01); C11D 7/50 (2013.01); C11D 2111/22 (2024.01)] 9 Claims
 
1. An alkaline cleaning composition, comprising a quaternary ammonium hydroxide, 5% to 40% by weight of propylene glycol monomethyl ether, 10% to 30% by weight of water, and a polar solvent;
wherein the polar solvent comprises a solvent having a structure shown in a following formula (3), (4), or (5), or a combination thereof:

OG Complex Work Unit Chemistry
wherein R1 and R2 are independently hydrogen or a C1-C6 alkyl group that is unsubstituted or at least one —CH2— is substituted with —O—; R3 and R4 are independently a C1-C4 alkylene group; and R5 and R6 are independently a C1-C3 alkyl group;

OG Complex Work Unit Chemistry
wherein R1 is hydrogen or a C1-C4 alkyl group that is unsubstituted or substituted with a hydroxyl group; R2 and R3 are independently hydrogen or a C1-C2 alkyl group; and n is an integer ranging from 1 to 4; and

OG Complex Work Unit Chemistry
wherein R1 is a C1-C3 alkyl group; and the alkaline cleaning composition is free of benzenesulfonic acid.