CPC G03F 7/162 (2013.01) | 7 Claims |
1. A substrate processing apparatus comprising:
a substrate holder that holds a substrate;
a plurality of nozzles that respectively supply a processing liquid to a substrate held by the substrate holder;
a plurality of liquid pipes that are flexible, have first portions respectively connected to the plurality of nozzles and supply a processing liquid to the plurality of nozzles;
a support that supports the plurality of nozzles and supports the first portions of the plurality of liquid pipes;
a containing member that is attached to the support and contains the plurality of nozzles and the first portions of the plurality of liquid pipes while allowing supply of a processing liquid to the substrate from the plurality of nozzles; and
a nozzle driver that moves each of the plurality of nozzles between a processing position above the substrate held by the substrate holder and a waiting position outwardly of the substrate held by the substrate holder by moving or rotating the support,
wherein the support includes
a plurality of nozzle fixing portions to which the plurality of nozzles are respectively fixed, and
a first pipe fixing portion to which the first portions of the plurality of liquid pipes are fixed while being bound.
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