US 12,292,681 B2
Imprint method, imprint apparatus, and method of manufacturing article
Naosuke Nishimura, Saitama (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Sep. 21, 2022, as Appl. No. 17/949,296.
Claims priority of application No. 2021-158395 (JP), filed on Sep. 28, 2021.
Prior Publication US 2023/0097588 A1, Mar. 30, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/0002 (2013.01) 10 Claims
OG exemplary drawing
 
1. An imprint method of forming, using a mold, a pattern of an imprint material on a substrate having a dimension smaller than a dimension of a holding surface of a substrate stage, the method comprising:
causing the holding surface of the substrate stage to hold a plate having a dimension larger than the dimension of the substrate;
causing the plate to support the substrate, by causing the holding surface of the substrate stage to hold the substrate via the plate;
bringing the mold into contact with the imprint material supplied onto the substrate;
curing the imprint material on the substrate; and
separating the mold from the cured imprint material,
wherein holding of the plate by the substrate stage is controlled while maintaining supporting of the substrate by the plate, such that the substrate is deformed into a convex shape together with the plate upon in the separating of the mold from the cured imprint material on the substrate.