| CPC C23C 16/0272 (2013.01) [B29C 48/0018 (2019.02); B29C 48/08 (2019.02); B29C 55/143 (2013.01); C08J 5/18 (2013.01); C23C 16/06 (2013.01); B29K 2067/003 (2013.01); B29L 2007/008 (2013.01); C08J 2367/02 (2013.01)] | 7 Claims | 

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               1. A gas-barrier aluminum deposition film comprising: 
            a thermoplastic base film; 
                a seed coating layer which is laminated on one surface of the thermoplastic base film and includes 1.0e+5 to 1.0e+10 functional groups of at least one type selected from the group consisting of a hydroxyl group (—OH), an amine group (—NH), and a carboxylic acid group (—COOH) within an area of 300 μm×300 μm; an aluminum deposition layer deposited on the seed coating layer; and wherein the seed coating layer is coated with a copolymer polyester-based coating composition, wherein a water vapor transmission rate (WVTR) of the gas-barrier aluminum deposition film is in a range of 0.01 to 0.5 g/m2·24 hr, and wherein an oxygen transmission rate (OTR) of the gas-barrier aluminum deposition film is in a range of 0.1 to 1.0 cc/m2·24 hr·atm. 
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