US 12,291,773 B2
Methods and systems for heating a wide bandgap substrate
Petar Atanackovic, Henley Beach South (AU)
Assigned to Silanna UV Technologies Pte Ltd, Singapore (SG)
Filed by Silanna UV Technologies Pte Ltd, Singapore (SG)
Filed on Feb. 27, 2023, as Appl. No. 18/175,363.
Application 18/175,363 is a division of application No. 17/661,389, filed on Apr. 29, 2022, granted, now 11,629,401.
Application 17/661,389 is a continuation of application No. PCT/IB2021/059945, filed on Oct. 27, 2021.
Prior Publication US 2023/0203643 A1, Jun. 29, 2023
Int. Cl. C23C 14/54 (2006.01); C23C 14/08 (2006.01); C23C 14/50 (2006.01); C30B 23/02 (2006.01); C30B 23/06 (2006.01); C30B 29/16 (2006.01); G01J 5/00 (2022.01); G01J 5/0802 (2022.01); G05D 23/19 (2006.01); H01J 37/32 (2006.01); H05B 1/02 (2006.01); H05B 3/14 (2006.01)
CPC C23C 14/541 (2013.01) [C23C 14/08 (2013.01); C23C 14/50 (2013.01); C30B 23/025 (2013.01); C30B 23/063 (2013.01); C30B 29/16 (2013.01); G01J 5/0007 (2013.01); G01J 5/0802 (2022.01); G05D 23/1928 (2013.01); H01J 37/32724 (2013.01); H05B 1/0233 (2013.01); H05B 3/141 (2013.01); H05B 2203/005 (2013.01)] 22 Claims
OG exemplary drawing
 
1. A system for radiatively heating a substrate in a vacuum deposition process, the system comprising:
a vacuum deposition chamber that operates at a pressure less than or equal to 5×10−4 Torr, wherein the vacuum deposition chamber is configured to grow an epitaxial layer on a deposition surface of the substrate;
a resistive heater in the vacuum deposition chamber, wherein the resistive heater is configured to generate radiative heat having a wavelength in a mid-infrared band of 5 μm to 40 μm that couples to a phonon absorption band of the substrate and results in phonon-based excitation to heat the substrate, wherein the resistive heater comprises two or more individually controlled resistive heating elements arranged in two or more zones;
a substrate holder for holding the substrate in the vacuum deposition chamber, wherein the substrate comprises a wide bandgap (WBG) semiconducting material and has an uncoated surface and the deposition surface opposite the uncoated surface, wherein the substrate holder is configured to position the uncoated surface to be spaced apart from and facing the two or more individually controlled resistive heating elements to receive the radiative heat; and
a heating control system comprising a pyrometer, wherein the pyrometer:
comprises an optical filter and a detector, wherein the optical filter is configured to selectively allow optical radiation in a mid-infrared wavelength range of 6 μm to 15 μm to pass through to the detector;
is configured to measure a plurality of temperatures across the deposition surface of the substrate, based on the optical radiation passing through the optical filter; and
is in communication with the resistive heater to provide feedback, the feedback comprising a signal including the plurality of temperatures, to control the two or more individually controlled resistive heating elements.