US 12,291,771 B2
Mask device and evaporation device
Naichao Mu, Wuhan (CN); Yuan Li, Wuhan (CN); Yu Xin, Wuhan (CN); Jun Ma, Wuhan (CN); and Lijing Han, Wuhan (CN)
Assigned to Wuhan Tianma Micro-Electronics Co., Ltd., Wuhan (CN); and Wuhan Tianma Micro-Electronics Co., Ltd. Shanghai Branch, Shanghai (CN)
Filed by Wuhan Tianma Micro-Electronics Co., Ltd., Wuhan (CN); and Wuhan Tianma Micro-Electronics Co., Ltd. Shanghai Branch, Shanghai (CN)
Filed on Nov. 30, 2023, as Appl. No. 18/525,005.
Application 18/525,005 is a continuation of application No. 15/888,104, filed on Feb. 5, 2018, granted, now 11,885,004.
Claims priority of application No. 201710807064.6 (CN), filed on Sep. 8, 2017.
Prior Publication US 2024/0093349 A1, Mar. 21, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 14/04 (2006.01); C23C 14/12 (2006.01)
CPC C23C 14/042 (2013.01) [C23C 14/12 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A mask module, comprising:
a framework;
at least one first strip plate fixed on the framework and extending along a first direction; and
a first mask located on a side, deviating from the framework, of the at least one first strip plate, the first mask including at least one preset area, and the at least one preset area including at least one opening, wherein:
the at least one first strip plate is provided with a first concave-convex structure on one side edge of the at least one first strip plate along the first direction;
at least one raised structure is provided in a middle position of the first concave-convex structure along the first direction;
in a direction perpendicular to a surface of the first mask, the first concave-convex structure and the at least one raised structure cover at least a first part of an area of the at least one opening of the at least one preset area; and
the at least one raised structure and the first strip plate are integrally formed.