CPC C23C 14/042 (2013.01) [C23C 14/24 (2013.01); H10K 71/166 (2023.02); H10K 71/00 (2023.02)] | 12 Claims |
1. A manufacturing method of a mask, comprising:
providing a first substrate, wherein the first substrate comprises a first surface and a second surface that are arranged opposite to each other;
etching the first surface to form a plurality of first grooves;
etching the second surface to form a plurality of third grooves, wherein the plurality of third grooves and the plurality of first grooves are in a one-to-one correspondence, and an opening area of each of the plurality of third grooves is greater than an opening area of each of the plurality of first grooves; on the second surface, a distance between adjacent ones of the plurality of third grooves is greater than a preset distance, wherein the preset distance is greater than zero;
applying a protective layer on an edge area of a side surface of each of the plurality of third grooves closer to the second surface;, wherein on the second surface, an angle between a surface tangent of the edge area of the side surface of each of the plurality of third grooves closer to the second surface and a first direction is less than or equal to 10°, wherein the first direction is a thickness direction of the mask;
etching the plurality of third grooves to form second grooves, wherein a depth of each of the second grooves is greater than a depth of each of the plurality of third grooves, and the second grooves and the plurality of first grooves penetrate the first substrate; and
removing the protective layer.
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