US 12,291,647 B2
Film, liquid composition, optical element, and imaging apparatus
Koichiro Nakamura, Kanagawa (JP); and Satoru Kusaka, Tokyo (JP)
Assigned to NIPPON SHEET GLASS COMPANY, LIMITED, Tokyo (JP)
Filed by Nippon Sheet Glass Company, Limited, Tokyo (JP)
Filed on Apr. 15, 2024, as Appl. No. 18/635,608.
Application 18/635,608 is a continuation of application No. 16/969,478, granted, now 11,987,722, previously published as PCT/JP2018/041533, filed on Nov. 8, 2018.
Claims priority of application No. 2018-023182 (JP), filed on Feb. 13, 2018; and application No. 2018-209453 (JP), filed on Nov. 7, 2018.
Prior Publication US 2024/0254363 A1, Aug. 1, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. C09D 183/04 (2006.01); C08K 7/24 (2006.01); C09D 7/61 (2018.01); G02B 1/111 (2015.01); G02B 1/118 (2015.01)
CPC C09D 183/04 (2013.01) [C09D 7/61 (2018.01); G02B 1/111 (2013.01); G02B 1/118 (2013.01); C08K 7/24 (2013.01); C08K 2201/003 (2013.01); C08K 2201/011 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A cured product comprising:
a polysilsesquioxane and a silica,
the cured product having an absorbance spectrum capable of being measured by an attenuated total reflection method with a Fourier transform infrared spectrometer,
the absorbance spectrum including:
an absorbance of Ia determined based on a local maximum of absorbance in an absorption band that is derived from a hydrocarbon group not directly bonded to a silicon atom;
an absorbance of Ib determined based on a local maximum of absorbance in an absorption band that is derived from a bond between a silicon atom and a nonreactive functional group; and
an absorbance of Ic determined based on a local maximum of absorbance in an absorption band that is derived from a bond between a silicon atom and a hydroxy group,
wherein at least one selected from the group consisting of Ib/Ia≥0.7 and Ib/Ic≥0.3 is satisfied.